厂价优惠供应半导体用电子级OMCATS
CVD/ALD (Chemical Vapr DePOSTTTION /Atomic Layer Depostion )化学气相沉积材料
|
Dielectrics PMD/IMD |
TEOS ,TEPO,TMPO,TEB,TMB |
|
Low K Dielectrics |
4MS ,OMCATS |
|
High K Dielectrics |
TAETO (Ta2O5 Precursor ) TEMAZ (ALD ZrO2 Precursor) TMA (Al2O3 Precursor) |
|
Metal Gate and Interconnect Metal |
TDMAT (TiN Precursor ) TiCl4 ( Ti /TiN Precursor ) |
|
Low-Temp Nitride/Oxide |
HCDS |
|
Diffusion |
POCl3 |
供应半導體化學氣相沉積材料，專業研發及製造各種先進 CVD/ALD (Chemical Vapr DePOSTTTION /Atomic Layer Depostion )化學氣相沉積材料。
CVD Precursor(化学气相沉积材料)
TDMAT / InCl3/TEOS/TMB/TEB
CVD Precursor(化學氣相沉積材料)
TDMAT/TiCl4/TMA/TEASAT/InI/InF3/InCl3/High-K/Low-K Material
TEOS,TMB,TEB,TMPO,TEPO,TDMAT,TiCl4等
898995850
